Harmonic Content of the Power Deposition into a Dual Frequency Capacitively Coupled Plasma
Application ID: 10218
Energy transfer from the time varying electrostatic field to electrons in a capacitively coupled plasmas (CCP) does not exclusively occur at twice the RF frequency. Due to the highly nonlinear mechanism of power transfer from the fields to the electrons, power deposition occurs at frequencies higher than twice the driving frequency. For dual frequency CCP reactors the harmonic content of the power deposition occurs at many different frequencies.
This model example illustrates applications of this type that would nominally be built using the following products:Plasma Module
however, additional products may be required to completely define and model it. Furthermore, this example may also be defined and modeled using components from the following product combinations:
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