Keynote: Modeling and Simulation in Semiconductor Wet Processes
Wet cleans and other liquid phase etches account for approximately 25% of all processing steps in the manufacturing of semiconductor devices. These cleaning steps are crucial because even nanometer-sized particles can cause devices to fail.
In this keynote talk from COMSOL Day: Semiconductor Manufacturing, Dr. Derek Bassett of Tokyo Electron gives a brief introduction to semiconductor wet cleans, including a comparison between batch wet processing and single wafer processing. Bassett also shares how simulation is crucial in understanding the underlying physics for two wet applications used in the semiconductor industry: chemical replacement in high-aspect-ratio holes and troubleshooting the presence of watermarks.
Derek Bassett is a member of technical staff at Tokyo Electron Ltd. and has a PhD in chemical engineering from the University of Texas.