Dynamic Simulation of Interface Shapes During Chemical Vapor DepositionJ. V. Jayaramakrishna, S. K. Thamida
National Institute of Technology Warangal, Warangal, Telangana, India
Chemical Vapor Deposition (CVD) finds application in many manufacturing processes of microelectronic devices and MEMS as a recent development. It is also useful for preparation of functionalized surfaces in microsensor kind of devices. The phenomena that is studied is deposition of a crystalline material for example Silicon from the gas phase substance such as Silicon Hydride (SiH4). The material gets deposited on a substrate surface due to chemical reaction. If the deposition is carried out in a micron sized well, then imaging the pattern of coating is slightly difficult. Hence a simulation is developed which can track the moving boundary or the interface of coated material. It is demonstrated through the use of COMSOL Multiphysics® software.