Dynamic Simulation of Interface Shapes During Chemical Vapor Deposition

J. V. Jayaramakrishna[1], S. K. Thamida[1]
[1]National Institute of Technology Warangal, Warangal, Telangana, India

Chemical Vapor Deposition (CVD) finds application in many manufacturing processes of microelectronic devices and MEMS as a recent development. It is also useful for preparation of functionalized surfaces in microsensor kind of devices. The phenomena that is studied is deposition of a crystalline material for example Silicon from the gas phase substance such as Silicon Hydride (SiH4). The material gets deposited on a substrate surface due to chemical reaction. If the deposition is carried out in a micron sized well, then imaging the pattern of coating is slightly difficult. Hence a simulation is developed which can track the moving boundary or the interface of coated material. It is demonstrated through the use of COMSOL Multiphysics® software.