Galleria dei Modelli

La Galleria dei Modelli raccoglie un'ampia varietà di modelli realizzati con COMSOL Multiphysics in diversi ambiti applicativi, inclusi quelli elettrico, meccanico, fluidico e chimico. E' possibile scaricare i file .mph dei modelli pronti all'uso e le istruzioni step-by-step per costruirli, e utilizzarli come punto di partenza per le proprie simulazioni. Lo strumento di Ricerca Rapida permette di trovare i modelli che si riferiscono alla propria area di interesse. Per scaricare i file .mph dei modelli è necessario effettuare il login o creare un account COMSOL Access associato a un numero di licenza valido.

In-Plane Microwave Plasma

Wave heated discharges may be very simple, where a plane wave is guided into a reactor using a waveguide, or very complicated as in the case with ECR (electron cyclotron resonance) reactors. In this example, a wave is launched into reactor and an Argon plasma is created. The wave is partially absorbed and reflected by the plasma which sustains the plasma.

Benchmark Model of a Capacitively Coupled Plasma

The underlying physics of a capacitively coupled plasma is rather complicated, even for rather simple geometric configurations and plasma chemistries. This model benchmarks the Capacitively Coupled Plasma physics interface against many different codes.

GEC ICP Reactor, Argon Chemistry

The GEC cell was introduced by NIST in order to provide a standardized platform for experimental and modeling studies of discharges in different laboratories. The plasma is sustained via inductive heating. The Reference Cell operates as an inductively-coupled plasma in this model. This model investigates the electrical characteristics of the GEC reference cell for argon chemistry.

Surface Chemistry Tutorial

Surface chemistry is often the most important and most overlooked aspect of reacting flow modeling. Surface rate expressions can be hard to find or not even exist at all. Often it is preferable to use sticking coefficients to describe surface reactions because they can be estimated intuitively. The tutorial model simulates outgassing from a wafer during a chemical vapor deposition (CVD) ...

3D Model of an ICP Reactor with Argon Chemistry

3D plasma modeling is possible to do in COMSOL. A square coil is placed on top of a dielectric window and is electrically excited at 13.56MHz. A plasma is formed in the chamber beneath the dielectric window, which contains Argon gas at low pressure (20 mtorr). The gas flows into the process chamber from two 2 inch ports and the gas is extracted through a single 4 inch port. The plasma is ...

Computing the Ion Energy Distribution Function

One of the most useful quantites of interest after solving a self-consistent plasma model is the ion energy distribution function (IEDF). The magnitude and shape of the IEDF depends on many of the discharge parameters; pressure, plasma potential, sheath width etc. At very low pressures the plasma sheath is said to be collisionless, meaning that the ion energy is not retarded by collisions with ...

Argon Boltzmann Analysis

The electron energy distribution function (EEDF) plays an important role in the overall behavior of discharges. Analytic forms of the EEDF exist such as Maxwellian or Druyvesteyn, but in some cases they fail to fit the discharge physics. This tutorial model investigates the effects of various parameters on the electron energy distribution function and rate coefficients for an argon discharge. ...

GEC CCP Reactor, Argon Chemistry, 1D

The NIST GEC CCP reactor provides a platform for studying capacitively coupled plasmas. Even the simplest plasma models are quite involved so a 1D example helps in understanding the physics without excessive CPU time. The problem has no steady-state solution, although a periodic steady-state solution is reached after a suitable number of RF cycles (usually >1000).

Harmonic Content of the Power Deposition into a Dual Frequency Capacitively Coupled Plasma

Energy transfer from the time varying electrostatic field to electrons in a capacitively coupled plasmas (CCP) does not exclusively occur at twice the RF frequency. Due to the highly nonlinear mechanism of power transfer from the fields to the electrons, power deposition occurs at frequencies higher than twice the driving frequency. For dual frequency CCP reactors the harmonic content of the ...

Plasma Display Panel

This model illustrates the physics of a dielectric barrier discharge which leads to generation of UV light. Such a discharge is used to generate the back light for plasma display panels.

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